Metal reflector grounding for noise reduction in light detector

ABSTRACT

The problem of reducing noise in image sensing devices, especially NIR detectors, is solved by providing ground connections for the reflectors. The reflectors may be grounded through vias that couple the reflectors to grounded areas of the substrate. The grounded areas of the substrate may be P+ doped areas formed proximate the surface of the substrate. In particular, the P+ doped areas may be parts of photodiodes. Alternatively, the reflectors may be grounded through a metal interconnect structure formed over the front side of the substrate.

REFERENCE TO RELATED APPLICATION

This Application is a Continuation of U.S. application Ser. No.16/684,871, filed on Nov. 15, 2019, the contents of which are herebyincorporated by reference in their entirety.

BACKGROUND

Integrated circuits (ICs) with image sensors are used in a wide range ofelectronic devices such as cameras and cell phones. In recent years,complementary metal-oxide semiconductor (CMOS) image sensors havelargely replaced charge-coupled device (CCD) image sensors. Compared toCCD image sensors, CMOS image sensors are favored due to low powerconsumption, small size, fast data processing, a direct output of data,and low manufacturing cost. Some types of CMOS image sensors includefrontside illuminated (FSI) image sensors and backside illuminated (BSI)image sensors. Many of these image sensors have been optimized fordetecting visible light. There is, however, a growing demand for imagesensors that detect non-visible radiation, especially near-infrared(NIR) for security, personal authentication, and range findingapplications.

BRIEF DESCRIPTION OF THE DRAWINGS

Aspects of the present disclosure are best understood from the followingdetailed description when read with the accompanying figures. It isnoted that, in accordance with the standard practice in the industry,various features are not drawn to scale. In fact, the dimensions of thevarious features may be arbitrarily increased or reduced for clarity ofdiscussion.

FIG. 1 illustrates a cross-sectional view of an integrated circuit (IC)device according to some aspects of the present disclosure.

FIG. 2 illustrates a cross-sectional view of an integrated circuit (IC)device according to some other aspects of the present disclosure.

FIG. 3 illustrates a cross-sectional view of an integrated circuit (IC)device according to some other aspects of the present disclosure.

FIGS. 4-20 illustrate a series of cross-sectional views of an IC deviceundergoing a manufacturing process according to some aspects of thepresent disclosure.

FIGS. 21-22 illustrate a series of cross-sectional views of an ICundergoing a manufacturing process according to some other aspects ofthe present disclosure.

FIG. 23 present a flow chart of a manufacturing process according tosome aspects of the present disclosure.

DETAILED DESCRIPTION

The present disclosure provides many different embodiments, or examples,for implementing different features of this disclosure. Specificexamples of components and arrangements are described below to simplifythe present disclosure. These are, of course, merely examples and arenot intended to be limiting. For example, the formation of a firstfeature over or on a second feature in the description that follows mayinclude embodiments in which the first and second features are formed indirect contact, and may also include embodiments in which additionalfeatures may be formed between the first and second features, such thatthe first and second features may not be in direct contact.

Backside illuminated CMOS image sensors suitable for detecting visiblelight require enhanced sensitivity for use in NIR sensing applications.One approach to providing enhanced sensitivity is to increase thethickness of the photo adsorption layer of the substrate. This approachhas limitations such as decreasing visible image quality throughincreased lateral crosstalk. Another approach to providing enhancedsensitivity is to use reflectors on the frontside of the substrate. Ithas been found, however, that charge accumulation on the reflectors canbecome a source of noise.

The present disclosure in various embodiments solves the problem ofreducing noise in image sensing devices, especially NIR detectors, byproviding ground connections for the reflectors. In some embodiments,the reflectors are grounded through vias that couple the reflectors togrounded areas of the substrate. In some of these teachings, thegrounded areas of the substrate are P⁺ doped areas that may be formedproximate the surface of the substrate. In some of these teachings, theP⁺ doped areas are parts of photodiodes. In some others of theseteachings, the reflectors are grounded through a metal interconnectstructure formed over the front side of the substrate.

A semiconductor images sensing IC device according to the presentteachings may include an array of photodiodes or other CMOS imagesensors formed in a semiconductor substrate. After forming thephotodiode array, a first inter-level dielectric (ILDO) layer may beformed over the substrate surface. Vias are formed through the firstinter-level dielectric layer to form contacts with the substrate. Insome of these teachings, one or more of those vias will be used tocouple a subsequently formed metal reflector with an area of thesubstrate held at ground potential. A hard mask may be formed over thefirst inter-level dielectric layer. The hard mask may be used toselectively pattern an opening partway through the inter-leveldielectric layer. The opening may be filled with metal. A planarizationprocess stopping on the hard mask may be used to remove excess metal.The remaining metal may form one or more reflectors that are spaced fromthe substrate by the inter-level dielectric layer.

A first metallization layer (M1) may be formed over the hard mask.Forming the first metallization layer may include depositing dielectric,etching to form openings through the dielectric, and filling theopenings to form various metal features. In some of these teachings, oneof those openings is formed over a reflector and one of the metalfeatures is formed in direct contact with the reflector. The reflectormay then be grounded through the metal feature.

During operation of a semiconductor image sensing IC device according tothe present disclosure, electrical charge carriers may transfer to thereflector. Those charges may be drained through a ground connectionbefore they accumulate sufficiently to create an electrical field thatcould be a source of noise in the IC device.

FIG. 1 illustrates an IC device 100 according to some aspects of thepresent disclosure. The IC device 100 includes a metal interconnectstructure 155 formed over a front side 150 of a semiconductor substrate137. A lens 141 on a back side 142 of the substrate 137 focuses light ona photodiode 143 formed within substrate 137. The photodiode 143 is apinned photodiode that includes a deep N-well 135 and a shallow P⁺ dopedpinning layer 149 proximate the surface of front side 150. Thephotodiode 143 could alternatively be a P-I-N photodiode or another typeof radiation sensing device. A reflector 153 is positioned above thefront side 150 to reflect light passing through the substrate 137 backonto the photodiode 143 in order to increase radiation sensitivity. Inaccordance with some aspects of the present teachings, the reflector 153is grounded to the pinning layer 149 of the photodiode 143 by a via 151.

The reflector 153 may be located proximate the substrate 137. In some ofthe present teachings, the reflector 153 is formed within an interleveldielectric layer 113 that is the first interlevel dielectric layer 113above the substrate 137. In some of the present teachings, theinterlevel dielectric layer 113 is a low-κ dielectric layer. Thereflector 153 is separated from the substrate 137 by several thin filmsand a portion of interlevel dielectric layer 113. The several thin filmsmay include, for example, an oxide layer 119, a resist protective oxide(RPO) layer 117, and or a contact etch stop layer 115 or the like. Thereflector 153 is a distance 152 from the substrate 137. In some of theseteachings, the distance 152 is in the range from 0.01 to 0.5 μm. In someof these teachings, the distance 152 is in the range from 0.05 to 0.3μm.

The photodiode 143 may be one in an array of like photodiodes formedwith the substrate 137. The substrate 137 may be any suitable type ofsemiconductor substrate. In some of the present teachings, the substrate137 is a single crystal semiconductor. In some of these teachings, thesubstrate 137 is silicon. The substrate 137 may also besilicon-geranium, indium phosphide, some other semiconductor material,or the like. A passivation layer 139 may be formed over the back end 142of the substrate 137. A well with the passivation layer 139 may beoccupied by a color filter 140 underneath the micro-lens 141.

The substrate 137 may be lightly P-doped. Deep P-wells 145 may be formedwithin the substrate 137 adjacent photodiodes 143. Electrical isolationmay be provided by shallow trench isolation (STI) structures 121.Alternatively, isolation may be provided by deep trench isolationsstructures, some other suitable isolation structures, or the like.

The metal interconnect structure 155 may include a plurality of metalinterconnect layer such as a first metallization layer 107, a secondmetallization layer 105, a third metallization layer 103, and additionalmetallization layers (not shown). Vias 104 may connect metal features102, such as wires and the like, between adjacent metallization layer103, 105, 107. Vias 104 and metal features 102 may be formed of metalssuch as copper, aluminum, gold, tungsten, and the like. Vias 104 andmetal features 102 are formed within a matrix of interlevel dielectric106. The interlevel dielectric 106 may be a low κ dielectric or anextremely low-k dielectric.

A low-k dielectric is a material having a smaller dielectric constantthan SiO₂. SiO₂ has a dielectric constant of about 3.9. Examples oflow-k dielectrics include organosilicate glasses (OSG) such ascarbon-doped silicon dioxide, fluorine-doped silicon dioxide (otherwisereferred to as fluorinated silica glass (FSG), organic polymer low-kdielectrics, and porous silicate glass. An extremely low-k dielectric isa material having a dielectric constant of about 2.1 or less. Anextremely low-k dielectric material is generally a low-k dielectricmaterial formed into a porous structure. Porosity reduces the effectivedielectric constant.

The photodiode 143 may be selectively couple to a floating diffusionnode 123 by a transfer transistor 147. The floating diffusion node 123may be an N⁺ doped area of the substrate 137 configured to accumulatecharges produced by the interaction of light with the photodiode 143.Additional transistors may be provided to operate the photodiode 143. Asingle pixel in a photodiode array of the IC device 100 may use two,three, four, five, or six transistors, for example. The coupling of thephotodiode 143 with the transfer transistor 147 may include an N⁺ dopedarea of the substrate 137 that couples the deep N-well 135 of thephotodiode 143 to a channel region of the transfer transistor 147. Thetransfer transistor 147 may include a gate electrode 129 separated fromthe substrate 137, which provides the channel region, by a gatedielectric layer 131. A hard mask layer 127 may be present over the gateelectrode 129. Spacers 125 may be formed to the sides of the gateelectrode 129.

FIG. 2 illustrates an IC device 200 according to some other aspects ofthe present disclosure. The IC device 200 is similar to the IC device100 except that in the IC device 200, the via 151 through which thereflector 153 is grounded couples with a deep P-well 145 in thesubstrate 137 that is not part of the photodiode 143. The deep P-well145 may be effectively maintained at a ground potential. Chargestransferring to the reflector 153 by one or another mechanism may drainthrough deep P-well 145.

FIG. 3 illustrates an IC device 300 according to some other aspects ofthe present disclosure. The IC device 300 is similar to the IC device100 except that in IC device 300 does not include the via 151 thatgrounds the reflector 153 to the substrate 137 in IC device 100.Instead, the reflector 153 is grounded by a metal feature 154 within thefirst metallization layer 107. The metal feature 154 may itself begrounded by connections made through the metal interconnect structure155.

In some embodiments, a support device 101 is affixed to the metalinterconnect structure 155 above the substrate 137. The support device101 may be, for example, a bulk substrate or a second IC chip. In someembodiments, the second IC chip is electrically coupled to the reflector153 through the metal interconnect structure 155. A second IC chip maycomprise a second metal interconnect structure (not shown) arranged overa second semiconductor substrate (not shown).

FIGS. 4-20 provide a series of cross-sectional views 400-2000 thatillustrate an integrated circuit device according to the presentdisclosure at various stages of manufacture according to a process ofthe present disclosure. Although FIGS. 4-20 are described in relation toa series of acts, it will be appreciated that the order of the acts mayin some cases be altered and that this series of acts are applicable tostructures other than the ones illustrated. In some embodiments, some ofthese acts may be omitted in whole or in part. It will also beappreciated that FIGS. 4-20 are not limited to a method of manufacturebut rather may stand alone as structures separate from the method.

FIG. 4 illustrate a cross-sectional view 400 of an IC device 100 or thelike at an early stage of manufacture. Cross-sectional view 400illustrates a substrate 137 in which deep P-wells 145 and a deep N-well135 have been formed. Deep N-well 135 may be formed through or almostthrough a full thickness of the substrate 137. The substrate 137 may belightly P-doped. The substrate 137 may be a single crystalsemiconductor. In particular, the substrate 137 may be silicon or thelike.

As further shown by the cross-sectional view 400 of FIG. 4, shallowtrench isolations regions 121 may be formed in the substrate 137.Shallow trench isolations regions 121 may be formed by etching trenchesin the substrate 137 and filling the trenches with a dielectric or adielectric precursor. The dielectric may be silicon dioxide (SiO₂) orthe like. A planarization process may be used to remove dielectric fromthe front side 150 of the substrate 137. The planarization process maybe chemical mechanical polishing (CMP).

As shown by the cross-sectional view 500 of FIG. 5, a transistor gatestack 502 may be formed over the front side 150 of the substrate 137.The transistor gate stack 502 may include a gate dielectric layer 507, agate electrode layer 505, and a hard mask layer 503. The gate dielectriclayer 507 may be silicon dioxide (SiO₂) or any other dielectric suitablefor the gate of a CMOS transistor. The gate dielectric layer 507 may bedeposited on the substrate 137 or grown by oxidizing a layer at thesurface of substrate 137. The gate electrode layer 505 may be dopedpolysilicon or the like or any other conductor suitable for the gate ofa CMOS transistor. The gate electrode layer 505 may be formed bychemical vapor deposition (CVD) or any other suitable process. The hardmask layer 503 may be silicon nitride or the like, or any other materialsuitable for a hard mask. The hard mask layer 503 may be formed bychemical vapor deposition (CVD) or any other suitable process.

As further shown by the cross-sectional view 500 of FIG. 5, aphotoresist mask 501 may be formed and patterned over the transistorgate stack 502. Photoresist mask 501 may be patterned by aphotolithographic process. The photoresist mask 501 may be a positive ornegative photoresist patterned by selective exposure through a reticleand selective removal of either the exposed or non-exposed portions totransfer the reticle pattern to the photoresist mask 501.

As shown by the cross-sectional view 600 of FIG. 6, the transistor gatestack 502 may be patterned using the photoresist mask 501. Thepatterning process may include etching through the various layers oftransistor gate stack 502. Any suitable etch process may be used. Theetching process may dry etch processes, such as plasma etching or thelike, and may include multiple stages. Patterning forms the transfertransistor 147 and incudes forming the hard mask layer 127 from the hardmask layer 503, the gate electrode 129 from the gate electrode layer505, and the gate dielectric layer 131 from the gate dielectric layer507.

As shown by the cross-sectional view 700 of FIG. 7, after forming thetransfer transistor 147 a photoresists mask 701 may be formed over thesubstrate 137 and the substrate 137 may be doped heavily N⁺ to formfloating diffusion node 123. This doping may also form a source/drainarea 133 of deep N-well 135 that provides a source/drain region for thetransfer transistor 147 and couples deep N-well 135 to the transfertransistor 147.

As shown by the cross-sectional view 800 of FIG. 8, the photoresistsmask 701 may then be stripped and another photoresists mask 801 formedfollowed by heavy P⁺ doping to form the pinning layer 149 of thephotodiode 143. As illustrated, the pinning layer 149 may extend beyondthe area of the deep N-well 135. The pinning layer 149 may extend to theSTI region 121 or stop short of the STI region 121 as shown in thisexample. In some of these teachings, the pinning layer 149 and otherheavily P⁺ doped regions have a concentration of dopants that is atleast 1×10¹⁸ atoms per cm³. In some of these teachings, the heavily P⁺doped regions have a concentration of dopants that is at least 1×10¹⁹atoms per cm³. In some of these teachings, the heavily P⁺ doped regionshave a concentration of dopants that is at least 3×10¹⁹ atoms per cm³.

As shown by the cross-sectional view 900 of FIG. 9, the photoresistsmask 801 may then be stripped and an oxide layer 119 formed over thesurface of the structure shown by the cross-sectional view 800 of FIG.8. This oxide layer 119 may be formed by CVD, plasma enhanced CVD(PECVD), or the like, or any other suitable process. In some of theseteachings, the oxide layer 119 is formed from tetraethyl orthosilicate(TEOS).

As shown by the cross-sectional view 1000 of FIG. 10, spacers 125 may beformed to the sides of the transfer transistor 147. Forming the spacers125 may include deposition of silicon nitride or some other spacermaterial by CVD or the like, or any other suitable process followed byetching to leave only the material that forms the spacers 125.

As shown by the cross-sectional view 1100 of FIG. 11, severalinterfacial layers may be deposited conformally over the structure shownby the cross-sectional view 1000 of FIG. 10. These may include the RPOlayer 117, the contact etch stop layer 115, or the like. As furthershown by the cross-sectional view 1100 of FIG. 11, a first interleveldielectric layer 113 (an ILDO layer) may then be formed. These layersmay be formed by any suitable process or combination of processes. TheILDO may be formed with a planar upper surface 112 or may be subjectedto a planarization process after deposition. A planarization processcould be CVD or the like.

As shown by the cross-sectional view 1200 of FIG. 12, a photoresist mask1203 may be formed over the interlevel dielectric layer 113 and used topattern openings through the interlevel dielectric layer 113 and otherintervening layers to extend the openings down to the substrate 137.These openings may include an opening 1205 to floating diffusion node123. In some of these teachings, these openings include an opening 1201onto the pinning layer 149 of the substrate 137.

As shown by the cross-sectional view 1300 of FIG. 13, the openings 1201,1205 shown in the cross-sectional view 1200 of FIG. 12 may be filledwith conductive material to form vias through interlevel dielectriclayer 113. In particular the opening 1201 may be filled to form the via151 and the opening 1205 may be filled to form the via 111. Theconductive material may be deposited or grown from a seed layer. Fillingthe openings 1201, 1205 with conductive material may be followed by aplanarization step to remove conductive material outside the openings1201, 1205. Vias 111, 151 may be a metal such as copper, aluminum, gold,tungsten, and the like. In some embodiments, vias 111, 151 are cobalt orthe like.

As shown by the cross-sectional view 1400 of FIG. 14, an etch stop layer109 may be formed over the structure illustrated by the cross-sectionalview 1300 of FIG. 13. Etch stop layer 109 may be silicon carbide (SiC)or the like, or some other dielectric material suitable for an etch stoplayer. In some embodiments, etch stop layer 109 is deposited to athickness in the range from 100 Å to 600 Å. In some embodiments, etchstop layer 109 is deposited to a thickness in the range from 300 Å to500 Å.

As shown by the cross-sectional view 1500 of FIG. 15, a photoresist mask1501 may be formed over the structure illustrated by the cross-sectionalview 1400 of FIG. 14 and used to etch an opening 1503 through the etchstop layer 109 and part way through the interlevel dielectric layer 113.The material of via 151 may have a lower etch rate than the dielectricof interlevel dielectric layer 113. As a result, via 151 may protrudeinto the opening 1503.

As shown by the cross-sectional view 1600 of FIG. 16, the photoresistmask 1501 may be stripped and metal 1601 may be grown or deposited tofill the opening 1503. The metal 1601 may deposit around the exposedportion of via 151. Metal 1601 may be formed by electroplating,electroless plating, physical vapor deposition (PVD) or the like, or byany other suitable process. The metal 1601 may be any material suitablefor a reflector. In some of these teachings, the metal 1601 is analuminum copper alloy (AlCu) or the like.

As shown by the cross-sectional view 1700 of FIG. 17, the excess metal1601 may be removed by a planarization process such as CVD to form thereflector 153. The planarization process may thin the etch stop layer109. As shown by the cross-sectional view 1800 of FIG. 18, an additionaldeposition may take place to thicken the etch stop layer 109 and toprovide a thickness of the etch stop layer 109 over the reflector 153.

As shown by the cross-sectional view 1900 of FIG. 19, a layer ofinterlevel dielectric 106 may be formed over the etch stop layer 109. Asfurther shown by the cross-sectional view 1900 of FIG. 19, a photoresist1903 may be formed over the interlevel dielectric 106 and used topattern openings 1901 through the interlevel dielectric 106. As shown bythe cross-sectional view 2000 of FIG. 20 the openings 1901 may be filledwith metal to form metal feature 102 and other metal features of thefirst metallization layer 107 (M1). The metal may be deposited or grownby any suitable process. A suitable process could be electroplating,electroless plating, physical vapor deposition (PVD) or the like.Additional processing may then be carried out to complete back end ofline (BEOL) processing to form the metal interconnect structure 155 andadd other features to produce a device such as the IC device 100 shownby FIG. 1.

Variations on the process illustrated by the cross-sectional views400-2000 of FIGS. 4 to 20 may be used to form other devices according tothe present teachings. For example, alternative placement of the via151, the formation of which is illustrated in the cross-sectional views1200 and 1300 of FIGS. 12 and 13, may be used to form the IC device 200of FIG. 2. In some embodiments, the via 151 that grounds the reflector153 is not formed at all and the reflector 153 is grounded by analternative route.

Cross-sectional views 2100 and 2200 of FIGS. 21 and 22 illustrate onealternative process in which the via 151 may not be formed. In additionto not forming the via 151, the process of these figures departs fromthe one illustrated by the cross-sectional views 400-2000 of FIGS. 4 to20 in that in addition to forming the opening 1901 in the photoresist1903 as shown by the cross-sectional view 1900 of FIG. 19, anotheropening 2101 is formed as shown by the cross-sectional view 2100 of FIG.21. The opening 2101 is formed over the reflector 153. Then, forming thefirst metallization layer 107 (M1) by filling the openings 1901, 2101 inthe interlevel dielectric layer 106 produces a metal feature 154 thatcontacts the reflector 153 as shown by the cross-sectional view 2100 ofFIG. 21. Further processing of this structure may provide a the ICdevice 300 shown by FIG. 3.

FIG. 23 provides a flow chart of a process 2300 according to someaspects of the present disclosure that may be used to produce integratedcircuit devices according to the present disclosure. While the process2300 is illustrated and described herein as a series of acts or events,it will be appreciated that the illustrated ordering of such acts orevents are not to be interpreted in a limiting sense. For example, someacts may occur in different orders and/or concurrently with other actsor events apart from those illustrated and/or described herein. Inaddition, not all illustrated acts may be required to implement one ormore aspects or embodiments of the description herein. Further, one ormore of the acts depicted herein may be carried out in one or moreseparate acts and/or phases.

The process 2300 begins with act 2301, forming deep N-wells 135 and deepP-wells 145 in a substrate 137 as shown by the cross-sectional view 400of FIG. 4. The substrate 137 may initially be lightly doped P. The deepN-wells 135 will correspond to pixels of photodiodes 143 and the deepP-wells 145 may provide isolation between adjacent photodiodes 143.

Act 2303 includes forming isolations structures 121, which are alsoshown by the cross-sectional view 400 of FIG. 4. The isolationstructures 121 may provide electrical isolation between devices formedin the substrate 137 proximate the front side 150.

Act 2305 includes forming a transistor gate stack 502 over the frontside 150 as shown in FIG. 5. The transistor gate stack 502 may be usedto form one type of transistor. The transistor gate stack 502 may beremoved from some areas of the substrate 137 and other transistor gatestacks (not shown) may be formed and patterned to provide other types oftransistors.

Act 2307 includes patterning the transistor gate stack 502 to form thetransfer transistor 147 as shown by the cross-sectional view 600 of FIG.6. The patterning of act 2307 may also produce other transistors servingother purposes.

Act 2309 includes doping the substrate 137 as shown by thecross-sectional view 700 of FIG. 7 to form the floating diffusion node123 and other heavily N⁺ doped areas such as the source/drain area 133.The transfer transistor 147 may provide alignment for this dopingprocess. A photoresist mask may be used to further restrict the areasthat are doped by act 2309.

Act 2311 includes doping as shown by the cross-sectional view 800 ofFIG. 8 to define the pinning layer 149 of photodiode 143 as shown inFIG. 8 and other heavily P⁺ doped areas on the front side 150 of thesubstrate 137. The areas that receive the heavy P⁺ doping may be limitedby a photoresist 801. In some embodiments, the pinning layer 149 isallowed to extend to the STI region 121.

Act 2313 includes forming the sidewall spacers 125 and the variousinterfacial layers on the front side 150 of the substrate 137 shown bythe cross-sectional views 900-1100 of FIGS. 9-11. The interfacial layersmay include the oxide layer 119, the resist protective oxide layer 117,and the etch stop layer 115. The oxide layer 119 may be formed beforethe sidewall spacers 125. The resist protective oxide layer 117 may beformed after the sidewall spacers 125.

Act 2315 includes forming the first interlevel dielectric layer (ILDO)113 as shown by the cross-sectional view 1100 of FIG. 11. The firstinterlevel dielectric layer 113 may be formed with a planar uppersurface or its upper surface may be planarized after its formation.

Act 2317 includes forming vias 111, 151 through the first interleveldielectric layer 113 as shown by the cross-sectional views 1200 and 1300of FIGS. 12 and 13. In some embodiments, the via 151 is formed to makecontact with the pinning layer 149. In some embodiments, the via 151 isformed to make contact with the deep P-well 145. In some embodiments,the via 151 is not formed at all.

Act 2319 includes forming the etch stop layer 109 over the firstinterlevel dielectric layer 113 as shown by the cross-sectional view1400 of FIG. 14. Act 2321 includes forming the reflector 153 as shown bythe cross-sectional views 1500-1700 of FIGS. 15-17. Forming thereflector 153 may include etching an opening 1503 in the firstinterlevel dielectric layer 113 as shown in FIG. 15, filling the opening1503 with metal 1601 as shown in FIG. 16, and chemical mechanicalpolishing as show in FIG. 17.

Act 2323 includes redepositing the etch stop layer 109 as shown by thecross-sectional view 1800 of FIG. 18. The redeposition may restore athickness of the etch stop layer 109 that was lost during formation ofthe reflector 153 and may also extend the etch stop layer 109 over thereflector 153.

Act 2325 includes forming the first metallization layer 107 over theetch stop layer 109 as shown by the cross-sectional views 1900 and 2000of FIGS. 19 and 20, or alternatively as shown by the cross-sectionalviews 2100 and 2200 of FIGS. 21 and 22. The first metallization layer107 may include metal features 102. In some embodiments, the firstmetallization layer 107 includes metal features 154 that provideconnections to the reflector 153 as shown in FIG. 22. Act 2327 includesadditional processing to complete formation of an IC device such as theIC device 100 of FIG. 1, the IC device 200 of FIG. 2, the IC device 300of FIG. 3, or the like.

Some aspects of the present teachings relate to an integrated circuit(IC) device that include a semiconductor substrate, a photodiode formedwithin the semiconductor substrate, a metal interconnect structureformed on the semiconductor substrate, and a reflector formed within themetal interconnect structure over the photodiode. According to thepresent teachings, the reflector is grounded.

Some aspects of the present teachings relate to semiconductor imagesensing device. The device includes a radiation-sensing region locatedin the semiconductor substrate. The radiation-sensing region is operableto sense radiation projected from a back side of the semiconductorsubstrate. The device further includes a reflector positioned on a frontside of the semiconductor substrate. The reflector is operable toreflect light passing through the semiconductor substrate back onto theradiation-sensing region. A connection to the reflector is providedthrough which the reflector may be coupled to ground. In some of theseteachings, the connection is to a metal interconnect structure. In someof these teachings, the connection is to the substrate.

Some aspects of the present teachings relate to a method ofmanufacturing an integrated circuit (IC) device. The method includesforming a photodiode array in a semiconductor substrate, forming adielectric layer over the semiconductor substrate, forming vias throughthe dielectric layer, forming a hard mask over the dielectric layer,using the hard mask to selectively etch an opening partway through thedielectric layer, filing the opening with metal, planarizing the metalto form a reflector, and forming a metal interconnect layer over thedielectric layer and the reflector. The reflector is connected to eitherone of the vias or a metal feature within the metal interconnect layer.

The foregoing outlines features of several embodiments so that thoseskilled in the art may better understand the aspects of the presentdisclosure. Those skilled in the art should appreciate that they mayreadily use the present disclosure as a basis for designing or modifyingother processes and structures for carrying out the same purposes and/orachieving the same advantages of the embodiments introduced herein.Those skilled in the art should also realize that such equivalentconstructions do not depart from the spirit and scope of the presentdisclosure, and that they may make various changes, substitutions, andalterations herein without departing from the spirit and scope of thepresent disclosure.

What is claimed is:
 1. An integrated circuit (IC) device, comprising: asemiconductor substrate; a photodiode formed within the semiconductorsubstrate; an interlevel dielectric layer directly over the photodiode;a reflector over the interlevel dielectric layer; a metallization layerover the interlevel dielectric layer; and an etch stop layer over theinterlevel dielectric layer; wherein a top of the etch stop layer isabove a top of the reflector; a bottom of the etch stop layer is belowthe top of the reflector; and the reflector is grounded.
 2. The ICdevice of claim 1, wherein the reflector is grounded to thesemiconductor substrate.
 3. The IC device of claim 2, wherein thereflector is grounded to a P⁺ doped area of the semiconductor substrate.4. The IC device of claim 3, wherein the P⁺ doped area of thesemiconductor substrate is a pinning region of the photodiode.
 5. The ICdevice of claim 1, wherein the etch stop layer extends over thereflector and is in contact with the top of the reflector.
 6. The ICdevice of claim 1, wherein the reflector is grounded through themetallization layer.
 7. The IC device of claim 1, wherein a wire withinthe metallization layer contacts the reflector.
 8. The IC device ofclaim 7, wherein: the reflector comprises an aluminum copper alloy(AlCu); and the wire comprises copper (Cu).
 9. The IC device of claim 1,wherein the photodiode is operative to detect near infrared light. 10.An integrated circuit (IC) device, comprising: a semiconductorsubstrate; a photodiode formed within the semiconductor substrate; areflector over the semiconductor substrate; and a contact plug directlybelow the reflector; wherein the reflector is electrically coupled tothe semiconductor substrate through the contact plug.
 11. The IC deviceof claim 10, wherein the contact plug couples the reflector to a P⁺doped area of the semiconductor substrate.
 12. The IC device of claim10, wherein the P⁺ doped area of the semiconductor substrate is part ofor contiguous with a P⁺ doped area of the photodiode.
 13. The IC deviceof claim 10, wherein the IC device is operative to detect near infraredlight.
 14. The IC device of claim 10, wherein the contact plug passesthrough a low κ dielectric layer.
 15. The IC device of claim 10, whereinthe contact plug comprises cobalt (Co).
 16. A method of manufacturing anintegrated circuit (IC) device, comprising: forming a photodiode arrayin a semiconductor substrate; forming a first dielectric layer over thesemiconductor substrate; forming a hard mask over the first dielectriclayer; using the hard mask to selectively etch a first opening partwaythrough the first dielectric layer; filing the first opening with afirst metal; planarizing the first metal to form a reflector; forming asecond dielectric layer over the semiconductor substrate forming asecond opening through the second dielectric layer, wherein the secondopening lands on the reflector; and filling the second opening with asecond metal to form a metal structure that is electrically coupled tothe reflector.
 17. The method of claim 16, wherein the metal structureis a wire.
 18. The method of claim 16, wherein the second dielectriclayer has a same composition as the hard mask.
 19. The method of claim16, wherein the second dielectric layer comprises an etch stop layer.20. The method of claim 16, wherein the second dielectric layercomprises an etch stop layer and an interlevel dielectric layer formedover the etch stop layer.